Reddy, N. M. M., Department of Mechanical Engineering, BITS Pilani, Hyderabad Campus, India

• Investigating Optimum SiO2 Nanolubrication During Turning of AISI 420 SS

  N. M. M. Reddy, P. K. Chaganti

  Engineering, Technology & Applied Science Research

  Volume: 9 | Issue: 1 | Pages: 3822-3825 | February 2019 | https://doi.org/10.48084/etasr.2537

  • Abstract
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